Polymer lasers

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  • Lasers continue to be an amazingly robust field of activity, one of continually expanding scientific and technological frontiers.

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  • In the next block processing features to detect a particular event in the case external devices, or to identify, study, and signal the brain to recognize patterns, will be used as input for the following blocks that translate to control command of the external device. Last but not least important, is the block set effects supervision Operative mode of BCI devices under the supervision of users, this is if the device is active in on-line / Off linemode, or if it ismodifying its internal parameters in the learning phase in order to regulate the activity of users....

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  • The stereolithographic (SL) process is performed on the equipment shown in Figure 1. The movable platform on which the 3D model is formed is initially immersed in a vat of liquid photopolymer resin to a level just below its surface so that a thin layer of the resin covers it. The SL equipment is located in a sealed chamber to prevent the escape of fumes from the resin vat. The resin changes from a liquid to a solid when exposed to the ultra- violet (UV) light from a low-power, highly focused laser.

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  • Because the photopolymer used in the SL process tends to curl or sag as it cures, models with overhangs or unsupported horizontal sections must be reinforced with supporting structures: walls, gussets, or columns. Without support, parts of the model can sag or break off before the polymer has fully set. Provision for forming these supports is included in the digitized fabrication data. Each scan of the laser forms support layers where necessary while forming the layers of the model.

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  • Dry andwet etching techniques based onsiliconand other semiconductor technologies are well known. For many metals, etching is a relatively cheap and well-established technique to obtain freeform structures with dimensions in the submillimeter range. This technique iswelldescribedinthe literature[1–5,7].Aphotosensitivepolymermask material is applied on themetal to be etched. Themask is exposed to light via a primary maskwithstructural layers.Here,different technologiesare applicable, andtheirdetails canbefoundintheliteratureonsemiconductorprocessingor inRefs[1–3].

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