The miniaturization and performance improvement in semiconductor devices and
integrated circuits (ICs) are expected to continue through leveraging of nanotechnologies and
nanomaterials. This evolution should accelerate the System-on-a-Chip (SoC) trend, i.e., singlechip
integration of multifunctional, mixed-signal electronic components, toward realizing
embedded nanoelectronic systems.
Software – at air interface, applications, protocol and network levels – is at the heart of the promise of software radio. At all levels the potential is vast and the implications are profound – the need for effective design tools to give functional reliability will be key to successful commercialization.
Surface Acoustic Wave (SAW) devices are widely used in multitude of device concepts mainly
in Micro Electro Mechanical Systems (MEMS) and communication electronics. As such,
SAW based micro-sensors, actuators and communication electronic devices are well known
applications of SAW technology. Due to their solid state design and fabrication compatible
with other modern technologies such as Microwave Integrated Circuits (MIC), MEMS, (Charge
Coupled Devices) CCD and integrated optic devices, SAW based sensors are considered to be
Microelectromechanical systems (MEMS) have played an increasingly important
role in sensor and actuator applications. And its key contribution is that it has enabled
the integration of multi-components (i.e., electronics, mechanics, fluidics and etc) on a
single chip and their integration has positive effects upon performance, reliability and
cost. Compared to conventional electrostatic, thermal or magnetic actuating schemes,
piezoelectric MEMS inkjet has the advantages of lower power consumption, lower
voltage operation and relatively larger driving force....
NetWare 6 is a reliable, highly-scalable version of NetWare which takes
advantage of high-powered Multi-Processor (MP) server hardware by
MP-enabling the complete packet transfer from the wire to the storage media.
This AppNote provides background information about NetWare 6’s MP
functionality and explains how MP-enabled programs run on NetWare 6. It details
the MP-related improvements made in NetWare 6 and discusses development
opportunities for the new OS.
Novell’s NetWare 6 is the Net Services software solution that brings one Net
accessibility to networked environments. But, you may ask, isn’t NetWare 6 just a
new version of the NetWare operating system workhorse? Why would I want to
upgrade my stable, reliable NetWare 5.1 network to NetWare 6? What’s so
special about NetWare 6? This AppNote provides an overview of the new and
enhanced features in NetWare 6 that make it a compelling upgrade for existing
customers and an attractive choice for new network installations....
Chapter 1: Software and software engineering. This chapter presents the following content: Software is designed and built by software engineers; software is used by virtually everyone in society; software engineers have a moral obligation to build reliable software that does no harm to other people; software engineers view "software" as being made up of the programs, documents, and data.
The term “CMOS MEMS” most often describes pro-
cesses that create microstructures directly out of the metal/
dielectric interconnect stack in foundry CMOS. The metal-
lization and dielectric layers, normally used for electrical
interconnect, now serve a dual function as structural layers.
For example, the suspended n-well of Figure 3(d) is consid-
ered CMOS MEMS, since its beam suspension is made
from the CMOS interconnect stack.
There is significant motivation for making MEMS out
of CMOS. Leveraging foundry CMOS for MEMS is fast,
reliable, repeatable, and economical.
In the MEMS industry, systems for deep reactive-ion etching
(DRIE) utilize fast pumping, fast-response mass-flow controllers
inductive coupling of power, and heated chamber and pump lines
that are critical to achieve reliable etch rates. In contrast, we have
achieved 8:1 aspect-ratio PhC structures with 62nm vertica
membrane walls using a standard reactive-ion etching process based
on a sidewall passivation processes. In the remainder of this section
we discuss this fabrication process.