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Response of Okra (Abelmoschus esculentus L.) to foliar application of silicon

Chia sẻ: Thu Thảo Thao Thu | Ngày: | Loại File: PDF | Số trang:6

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A field experiment was carried out, with a view to study the Response of okra (Abelmoschus esculentus L.) to foliar application of silicon at Vegetable Research Scheme, Regional Horticultural Research Station of the Navsari Agricultural University, Navsari, Gujarat, India between 2015 to 2017 during summer season. The experiment was conducted in Randomized Block Design with three repetitions. Foliar application of Orthosilicic acid and Oligomeric silicic acid + Boric acid (OSAB – Si plus) was given at 30, 45 and 60 DAS at 0.02, 0.04 and 0.06 percentage level. The results revealed that higher values for growth and yield characters namely, plant height, chlorophyll content, number of fruits per plant and fruit yield (kg/ha) were recorded higher Oligomeric silicic acid + Boric acid (OSAB – Si plus) at 0.02 percentage level during all the three years of experiment.

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Nội dung Text: Response of Okra (Abelmoschus esculentus L.) to foliar application of silicon

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