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Suppression of out diffusion effect of dopants by the HfO2 diffusion barrier for highly n doped Ge epilayers grown on Si(001) substrate

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Suppression of out diffusion effect of dopants by the HfO2 diffusion barrier for highly n doped Ge epilayers grown on Si(001) substrate

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Ge is a potential candidate for the realization of Si-based light sources that are compatible with CMOS technology. Electron doping in Ge is an efficient method to modify its band gap structure to enhance the radiative recombination of Ge film. Post growth thermal treatment is a necessary step to activate the dopants and ameliorate the film’s crystal quality.

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Nội dung Text: Suppression of out diffusion effect of dopants by the HfO2 diffusion barrier for highly n doped Ge epilayers grown on Si(001) substrate

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