Three-Dimensional Micro-Channel Fabrication in Polydimethylsiloxane (PDMS) Elastomer
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Dry andwet etching techniques based onsiliconand other semiconductor technologies are well known. For many metals, etching is a relatively cheap and well-established technique to obtain freeform structures with dimensions in the submillimeter range. This technique iswelldescribedinthe literature[1–5,7].Aphotosensitivepolymermask material is applied on themetal to be etched. Themask is exposed to light via a primary maskwithstructural layers.Here,different technologiesare applicable, andtheirdetails canbefoundintheliteratureonsemiconductorprocessingor inRefs[1–3].Thepolymer is thendeveloped.Thismeans that thenon-exposedparts are polymerizedinsuchaway that they cannot be diluted by a solvent that is used to remove the rest of the polymer covering the parts to be etched.Thus, amask is formed, and themetal is etched through theopeningsof thismask.Togeneratethe etchingmask,other techniques suchasdirect mask writing with a laser are also possible...
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