Wireless Sensors and Instruments P2

Sputtering is similar to vacuum deposition. In this method, an inert gas such as argon or helium is introduced into a chamber that contains anode and cathode electrodes supplied by an external high-voltage source. The anode contains the sample to be deposited on and the cathode contains the deposited material. The principle is that the high voltage ignites a plasma effect in the inert gas and the gas ions bombard the target containing the material to be deposited. When the kinetic energy of the bombarding ions is sufficiently high, some of the atoms from the target surface are freed and...