Demonstration on ferroelectric-gate thin film transistor NAND-type array with disturbance free operation

A novel concept of NAND memory array has been proposed by using only ferroelectricgate thin film transistors (FGTs), whose structure is constructed from a sol-gel ITO channel and a sol-gel stacked ferroelectric between Bi3.25La0.75Ti3O12 and PbZr0.52TiO0.48O3 (BLT/PZT) gate insulator.