Lecture ECE 6450 Microelectronic - Chapter 7: Lithography and pattern transfer

Lecture ECE 6450 Microelectronic - Chapter 7: Lithography and pattern transfer. After studying this section will help you understand PR pattern is same as mask. On exposure to light, light degrades the polymers (described in more detail later) resulting in the photoresist being more soluble in developers. The PR can be removed in inexpensive solvents such as acetone.