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Lecture ECE 6450 Microelectronic - Chapter 11: Etching techniques
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Lecture ECE 6450 Microelectronic - Chapter 11: Etching techniques. After studying this section will help you understand Anisotropy can depend on mean Increasing Mean Free Path free path, or on DC plasma bias. Increasing mean free path (generally) increases anisotropy. Increasing DC bias (generally) increases anisotropy.
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